专利名称：Microwave plasma processing apparatus and
microwave supplying method
发明人：Kazushi Kaneko,Toshihiko Iwao,Satoru
Kawakami
申请号：US14326649申请日：20140709公开号：US09305751B2公开日：20160405
专利附图：
摘要：A microwave plasma processing apparatus includes a processing space; amicrowave generator which generates microwaves for generating a plasma; a distributor
which distributes the microwaves to a plurality of waveguides; an antenna installed in aprocessing container to seal the processing space and to radiate microwaves distributedby the distributor, to the processing space; and a monitor unit configured to monitor avoltage of each of the plurality of waveguides. A control unit acquires a control value of adistribution ratio of the distributor, which corresponds to a difference between a voltagemonitor value of the monitor unit and a predetermined voltage reference value, from astorage unit that stores the difference and the control value corresponding to eachother. The control unit is also configured to control the distribution ratio of thedistributor, based on the acquired control value.
申请人：TOKYO ELECTRON LIMITED
地址：Tokyo JP
国籍：JP
代理机构：Rothwell, FIgg, Ernst & Manbeck, P.C.
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